Assoc. Prof. Dr. Shuxia Zhao | Theoretical Advances | Best Researcher Award
Associate Professor at Dalian University of Technology, China
Dr. Shuxia Zhao is an Associate Professor at the Dalian University of Technology, with a specialization in electronegative and inductively coupled plasmas. She has an extensive academic background, with degrees in Physics, Materials Science, and Plasma Physics from Hebei Normal University and Dalian University of Technology, followed by Postdoctoral Research at the University of Antwerp. Dr. Zhao’s expertise lies in exploring the complex discharge structures of plasma and establishing interdisciplinary links across various fields of plasma physics.
Profile
Early Academic Pursuits ๐
Dr. Zhao began her academic journey at Hebei Normal University in 2000, where she completed her Bachelor’s degree in Physics. She continued her studies at the same institution, earning her Master’s degree in Physics and Chemistry of Material in 2007. Further refining her expertise, she pursued her Doctorate at Dalian University of Technology, specializing in Plasma Physics. Dr. Zhao also enriched her research experience as a Postdoctoral Researcher at the University of Antwerp, focusing on fluorocarbon inductively coupled plasmas.
Professional Endeavors ๐ผ
Dr. Zhao has contributed to various significant research projects funded by the National Natural Science Foundation of China. In her current role as Associate Professor at DUT since 2013, she continues to advance knowledge in electronegative plasmas and inductively coupled plasmas. Dr. Zhao has led industry collaborations, notably with North microelectronics base, enhancing plasma source technologies.
Contributions and Research Focus ๐ฌ
Dr. Zhaoโs research explores the discharge mechanism and etching processes of fluorocarbon plasmas, as well as the complex discharge structures of electronegative plasmas. She is particularly interested in low-temperature plasmas and their potential connections with high-temperature fusion plasmas and astrophysical plasmas. Her work on mode transition and hysteresis in inductively coupled plasma sources has provided critical insights into plasma behavior and interactions.
Impact and Influence ๐
Dr. Zhaoโs groundbreaking work in plasma science has impacted both the academic community and the industry. Her research has provided important theories and models that enhance the understanding of plasma behaviors and their applications in various fields, including microelectronics and fusion energy. Her published books and articles have been well-cited, showcasing her role in advancing plasma physics.
Academic Citations ๐
Dr. Zhaoโs research contributions are widely recognized, with a Web of Science ResearcherID of AFT-8684-2022. She has published 39 journals in renowned international databases like SCI and Scopus. Her work is highly cited and continues to shape plasma science research globally.
Research Skills ๐งโ๐ฌ
Dr. Zhao is skilled in fluid modeling, plasma diagnostics, and theoretical plasma physics. She has developed innovative software for modeling argon inductively coupled plasmas and ionic species transport coefficients in low-pressure RF plasmas, securing patents for these developments. Her expertise extends to data analysis, numerical simulations, and plasma characterization.
Teaching Experience ๐
Dr. Zhao has been an educator at Dalian University of Technology for over a decade. She is deeply invested in nurturing the next generation of plasma scientists and engineers. Dr. Zhao’s commitment to teaching and mentoring extends beyond the classroom, as she actively supervises graduate students and postdoctoral researchers in their own academic pursuits.
Legacy and Future Contributions ๐ฑ
As Dr. Zhao continues to explore the complexities of inductively coupled plasmas, her future work will likely further advance the field of plasma physics, especially in the context of microelectronics and fusion energy. Her research legacy is one of interdisciplinary collaboration, innovative discoveries, and educational excellence, contributing to both scientific advancements and technological applications.
Publications Top Notes
Simulation of mode transitions in capacitively coupled Ar/O2 plasmas
-
Authors: X. Liu, S. Zhang, S. Zhao, H. Li, X. Ren
Journal: Plasma Science and Technology
Year: 2024
Self-Coagulation Theory and Related Comet- and Semi-Circle-Shaped Structures in Electronegative and Gaseous Discharging Plasmas in the Laboratory
-
Authors: Y. Tian, S. Zhao
Journal: Applied Sciences (Switzerland)
Year: 2024
Effect of gas flow on the nanoparticles transport in dusty acetylene plasmas
-
Authors: X. Liu, W. Liu, X. Zhang, X. Dong, S. Zhao
Journal: Plasma Science and Technology
Year: 2023